US startup XLight has raised 40 million dollars in Series B funding to support the development and prototyping of an EUV light source based on a free-electron laser (FEL). The firm aims to have an operational prototype ready by 2028.
ASML’s EUV sources generate laser‑produced plasma (LPP) using high‑power CO2 lasers to excite tin droplets. Development of this technology was initiated by US firm Cymer, which was acquired by ASML in 2012 to speed up industrialization. The current roadmap takes source power to 1000+ watts.
The proposed FEL system uses a particle accelerator to generate electron bunches that pass through magnetic undulators, producing coherent EUV radiation. The company claims its FEL can deliver roughly four times the EUV output of conventional LPP systems and support multiple wafer lithography tools from a single source unit, as opposed to one dedicated source per ASML system. The FEL approach also promises wavelength tunability below the current 13.5 nm standard.
This article is exclusively available to premium members of Bits&Chips. Already a premium member? Please log in. Not yet a premium member? Become one for just €20 for the first year and enjoy all the benefits.
